Abstract
The structural and electronic properties of pure and Ti3+-doped α-Al2O3 were calculated in the present paper by using the first-principles methods. Special attention has been paid to the location of the Ti3+ states (3d1 electron configuration) in the band gap; the lowest 3d states are at about 4.78 eV above the top of the valence band. The crystal field strength 10Dq at the Ti3+ site was estimated from the density of states diagrams to be about 17,700 cm−1. The structural optimization of the unit cell was also performed at elevated hydrostatic pressure in the range from 0 to 25 GPa. By application of the Murnaghan equation to the obtained results, the bulk modulus of α-Al2O3 was estimated to be 225.69 GPa. In addition, from the analysis of the Ti3+3d density of states the distance dependence of the crystal field strength was found to be described by the following function: 10Dq=61.744/R4.671, where R is expressed in Å and 10Dq in eV.
| Original language | English |
|---|---|
| Pages (from-to) | 178-183 |
| Number of pages | 6 |
| Journal | Physica B: Condensed Matter |
| Volume | 532 |
| DOIs | |
| Publication status | Published - 1 Mar 2018 |
| Externally published | Yes |
Keywords
- AlO:Ti
- Crystal field effects
- Electronic structure
- First-principles calculations
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