Skip to main navigation Skip to search Skip to main content

Antiferroelectric PbZrO3 thin films: Structure, properties and irradiation effects

  • A. Sternberg*
  • , K. Kundzins
  • , V. Zauls
  • , I. Aulika
  • , L. Čakare
  • , R. Bittner
  • , H. Weber
  • , K. Humer
  • , D. Lesnyh
  • , D. Kulikov
  • , Y. Trushin
  • *Corresponding author for this work
  • University of Latvia
  • J. Stefan Institute
  • TU Wien
  • Peter the Great St. Petersburg Polytechnic University

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)

Abstract

Irradiation effects on highly oriented antiferroelectric PbZrO3 and ferroelectric Pb0.92La0.08(Zr0.65Ti0.35) O3 thin films are investigated being exposed to neutron irradiation up to fluence 2*1022 m-2. The higher resistance of antiferroelectric PbZrO3 thin films as compared to ferroelectric heterostructures to large fluences of neutron irradiation is recognized and discussed. Influence of two factors (structural and charge) was taken into account analysing irradiation effects on materials of different polarization states: ferroelectric PLZT (ceramics and thin films) and antiferroelectric PbZrO3 films.

Original languageEnglish
Pages (from-to)1653-1657
Number of pages5
JournalJournal of the European Ceramic Society
Volume24
Issue number6
DOIs
Publication statusPublished - Jun 2004

Keywords

  • Antiferroelectric and ferroelectric thin films
  • Dielectric properties
  • Neutron irradiation
  • Oxygen vacancies
  • Radiation-induced charges

Fingerprint

Dive into the research topics of 'Antiferroelectric PbZrO3 thin films: Structure, properties and irradiation effects'. Together they form a unique fingerprint.

Cite this