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Characterization of crystalline structure and morphology of Ga2O3 thin film grown by MOCVD technique

  • University of Latvia

Research output: Chapter in Book/Report/Conference proceedingConference paperResearchpeer-review

3 Citations (Scopus)

Abstract

Growth of gallium oxide thin film was realized with MOCVD on (0001) sapphire substrate. Structural and compositional properties of thin film were studied employing trimethylgallium and water as precursors, carrier gases were H2 and N2. Obtained film is polycrystalline and predominantly consisted of (201) oriented β-Ga2O3. Sample exhibited blue luminescence which is attributed to oxygen vacancies. H2 gas proved to have beneficial effect on film quality and overall growth process.

Original languageEnglish
Title of host publicationEngineering Materials and Tribology XXV
PublisherTrans Tech Publications Ltd
Pages253-257
Number of pages5
ISBN (Print)9783035710724
DOIs
Publication statusPublished - 2017
Event25th International Baltic Conference of Engineering Materials and Tribology – BALTMATTRIB - Riga, Latvia
Duration: 3 Nov 20164 Nov 2016

Publication series

NameKey Engineering Materials
Volume721 KEM
ISSN (Print)1013-9826
ISSN (Electronic)1662-9795

Conference

Conference25th International Baltic Conference of Engineering Materials and Tribology – BALTMATTRIB
Country/TerritoryLatvia
CityRiga
Period3/11/164/11/16

OECD Field of Science

  • 1.3 Physical Sciences
  • 2.5 Materials Engineering

Keywords

  • Crystal structure
  • Gallium oxide
  • MOCVD
  • Sapphire
  • Trimethylgallium
  • Water

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