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Current-voltage characteristic of n-p-p+ structures based on a chromium-compensated silicon-germanium solid solution

  • A. S. Saidov*
  • , A. Yu Leǐderman
  • , B. Sapaev
  • , S. Zh Karazhanov
  • , D. V. Saparov
  • *Corresponding author for this work
  • Academy of Sciences of the Republic of Uzbekistan

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Statistical currents in the n-p-p+ structures, synthesized on the basis of a chromium-compensated silicon-germanium solid solution, have been studied experimentally. The I-V characteristic of such structures was observed to have a section in which the current increases sublinearly with voltage V ≈ V0exp(JaW). The experimental results are explained on the basis of the theory of injection de;etion.

Original languageEnglish
Pages (from-to)550-551
Number of pages2
JournalSemiconductors
Volume30
Issue number6
Publication statusPublished - Jun 1996
Externally publishedYes

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