Abstract
MgO and AI2O3 crystals have been implanted with Ne ions at temperatures between 90 K and 720 K and the damaged layers were investigated by optical absorption spectroscopy and X-ray diffraction. The damage production is discussed in terms of the number of F-centers, of the change of the lattice parameter, and of the diffuse scattering intensity close to Bragg reflections. The stability of the defects was tested in addition by subsequent subthreshold e--irradiations. No effect of an applied electric field on the defect production is observed for both oxides.
| Original language | English |
|---|---|
| Pages (from-to) | 169-173 |
| Number of pages | 5 |
| Journal | Radiation Effects and Defects in Solids |
| Volume | 136 |
| Issue number | 1-4 |
| DOIs | |
| Publication status | Published - 1995 |
Keywords
- AI2O3
- defect agglomerates
- electron irradiation
- F-centers
- ion implantation
- MgO
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