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Defects in ion implanted and electron irradiated MgO and A1203

  • Jülich Research Centre
  • University of Illinois at Urbana-Champaign

Research output: Contribution to journalArticlepeer-review

54 Citations (Scopus)

Abstract

MgO and AI2O3 crystals have been implanted with Ne ions at temperatures between 90 K and 720 K and the damaged layers were investigated by optical absorption spectroscopy and X-ray diffraction. The damage production is discussed in terms of the number of F-centers, of the change of the lattice parameter, and of the diffuse scattering intensity close to Bragg reflections. The stability of the defects was tested in addition by subsequent subthreshold e--irradiations. No effect of an applied electric field on the defect production is observed for both oxides.

Original languageEnglish
Pages (from-to)169-173
Number of pages5
JournalRadiation Effects and Defects in Solids
Volume136
Issue number1-4
DOIs
Publication statusPublished - 1995

Keywords

  • AI2O3
  • defect agglomerates
  • electron irradiation
  • F-centers
  • ion implantation
  • MgO

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