Skip to main navigation Skip to search Skip to main content

Electrochromism in oxyfluoride thin films

  • A. Azens*
  • , A. Gutarra
  • , B. A. Stjerna
  • , Claes G. Granqvist
  • , J. Gabrusenoks
  • , Andrejs R. Lusis
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference paperResearchpeer-review

3 Citations (Scopus)

Abstract

Oxyfluoride films based on W and Ti were prepared by reactive sputtering in plasmas containing O2 + CF4. The deposition rate was large, particularly when chemical sputtering was promoted by heating the target. The films could show large charge insertion/extraction, high coloration efficiency, and good cycling durability.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages435-442
Number of pages8
ISBN (Print)0819415642
Publication statusPublished - 1994
Externally publishedYes
EventOptical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII - Freiburg, Ger
Duration: 18 Apr 199422 Apr 1994

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2255
ISSN (Print)0277-786X

Conference

ConferenceOptical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII
CityFreiburg, Ger
Period18/04/9422/04/94

Fingerprint

Dive into the research topics of 'Electrochromism in oxyfluoride thin films'. Together they form a unique fingerprint.

Cite this