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Fluorine-doped SiO2 glasses for F2 excimer laser optics: Fluorine content and color-center formation

  • Hideo Hosono*
  • , Masafumi Mizuguchi
  • , Linards Skuja
  • , Tohru Ogawa
  • *Corresponding author for this work
  • Institute of Science Tokyo
  • Semiconduct. Leading Edge Technol.

Research output: Contribution to journalArticlepeer-review

54 Citations (Scopus)

Abstract

Color-center formation in F-doped, OH-free synthetic SiO2 glasses by irradiation with F2 excimer lasers (157 nm) was examined as a function of the F content. The concentration of photoinduced E′ centers was reduced to ∼1/20 by 1 mol.% F2 doping and remained almost constant on further doping to 7.3 mol. %. The absorption edge was considerably shifted to a lower wavelength (157.4 nm → 153 nm for a 5-mm-thick sample) by 1-mol. % doping and decreased only slightly on further doping. The intensities of the Raman bands that are due to three- and four-membered ring structures were significantly reduced by 1-mol. % F doping. These results strongly suggest that elimination of strained Si - O - Si bonds by F doping plays a central role in the improvement of radiation resistance of SiO2 glasses to F2 laser light.

Original languageEnglish
Pages (from-to)1549-1551
Number of pages3
JournalOptics Letters
Volume24
Issue number22
DOIs
Publication statusPublished - 15 Nov 1999
Externally publishedYes

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