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Formation of porous Ga2O3/GaAs layers for electronic devices

  • Yana Suchikova
  • , Andriy Lazarenko
  • , Sergii Kovachov
  • , Abay Usseinov
  • , Zhakyp Karipbaev
  • , Anatolijs Popovs

Research output: Chapter in Book/Report/Conference proceedingConference paperResearchpeer-review

32 Citations (Scopus)

Abstract

The article presents a simple and cheap method to form a porous structure of Ga2O3/GaAs on the surface of monocrystalline gallium arsenide. It is shown that two-stage etching in the nitric acid solution leads to massive etching pits as well as small pores on the surface. Ethanol added to the electrolyte solution in the second stage enables to form a passivating Ga2O3 layer. The obtained structures were investigated using SEM, EDX and Raman spectroscopy.

Original languageEnglish
Title of host publicationProceedings - 16th International Conference on Advanced Trends in Radioelectronics, Telecommunications and Computer Engineering, TCSET 2022
Place of Publication[Piscataway
PublisherIEEE]
Pages410-413
Number of pages4
ISBN (Electronic)9781665468619
ISBN (Print)9781665468619
DOIs
Publication statusPublished - 2022

Publication series

NameProceedings - 16th International Conference on Advanced Trends in Radioelectronics, Telecommunications and Computer Engineering, TCSET 2022

Keywords

  • EDX
  • electrochemical etching
  • gallium arsenide
  • gallium oxide
  • Raman spectrum

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