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Interferometric measurements of electric field-induced displacements in piezoelectric thin films

  • A. L. Kholkin*
  • , Ch Wütchrich
  • , D. V. Taylor
  • , N. Setter
  • *Corresponding author for this work
  • Swiss Federal Institute of Technology Lausanne

Research output: Contribution to journalArticlepeer-review

396 Citations (Scopus)

Abstract

Interferometric measurements of electric field-induced displacements in piezoelectric thin films using single-beam and double-beam optical detection schemes are reported. It is shown that vibrational response measured with a single-beam interferometer includes a large contribution of the bending motion of substrate. Therefore, it is difficult to apply single-beam technique for piezoelectric measurements in thin films. To suppress the bending effect a high-resolution double-beam interferometer is proposed. The sensitivity of the interferometer is significantly improved in comparison with previously reported system. The interferometer is shown to resolve small displacements without using a lock-in technique. An example of the interferometric capabilities is demonstrated with experimental results on electric field, frequency, and time dependences of piezoelectric response for quartz and Pb(Zr,Ti)O3 thin film.

Original languageEnglish
Pages (from-to)1935-1941
Number of pages7
JournalReview of Scientific Instruments
Volume67
Issue number5
DOIs
Publication statusPublished - May 1996
Externally publishedYes

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