Interstitial OH radicals in F2-laser-irradiated bulk amorphous SiO2

Koichi Kajihara; Masahiro Hirano; Linards Skuja; Hideo Hosono

doi:10.1021/jp061370y

Interstitial OH radicals in F₂-laser-irradiated bulk amorphous SiO₂

Koichi Kajihara^*
, Masahiro Hirano
, Linards Skuja
, Hideo Hosono

^*Corresponding author for this work

Laboratory of Optical Materials, Institute of Solid State Physics

Japan Science and Technology Agency
Institute of Science Tokyo

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

An interstitial hydroxyl radical (HO^̇) has been generated in bulk amorphous SiO₂ (a-SiO₂) loaded with interstitial H₂O molecules and exposed to F₂ laser light (hv = 7.9 eV, λ = 157 nm) at 77 K. F₂ laser light dissociates an O-H bond of interstitial H₂O into a pair of hydrogen atom (H^̇) and HO⁰. The resultant H⁰ disappears below 150 K, whereas HO^̇ is detectable after thermal annealing at 200 K. The electron paramagnetic resonance (EPR) signal of the interstitial HO^̇ recorded at 77 K is similar to that formed in amorphous ice, indicating that HO^̇ is confined in an orthorhombic field by hydrogen bonding, probably with adjacent H₂O molecules, silanol (SiOH) groups, and bridging oxygen atoms in the a-SiO₂ network.

Original language	English
Pages (from-to)	10224-10227
Number of pages	4
Journal	Journal of Physical Chemistry B
Volume	110
Issue number	21
DOIs	https://doi.org/10.1021/jp061370y
Publication status	Published - 1 Jun 2006

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title = "Interstitial OH radicals in F2-laser-irradiated bulk amorphous SiO2",

abstract = "An interstitial hydroxyl radical (H{\.O}) has been generated in bulk amorphous SiO2 (a-SiO2) loaded with interstitial H2O molecules and exposed to F2 laser light (hv = 7.9 eV, λ = 157 nm) at 77 K. F2 laser light dissociates an O-H bond of interstitial H2O into a pair of hydrogen atom ({\.H}) and HO0. The resultant H0 disappears below 150 K, whereas H{\.O} is detectable after thermal annealing at 200 K. The electron paramagnetic resonance (EPR) signal of the interstitial H{\.O} recorded at 77 K is similar to that formed in amorphous ice, indicating that H{\.O} is confined in an orthorhombic field by hydrogen bonding, probably with adjacent H2O molecules, silanol (SiOH) groups, and bridging oxygen atoms in the a-SiO2 network.",

author = "Koichi Kajihara and Masahiro Hirano and Linards Skuja and Hideo Hosono",

year = "2006",

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doi = "10.1021/jp061370y",

language = "English",

volume = "110",

pages = "10224--10227",

journal = "Journal of Physical Chemistry B",

issn = "1520-6106",

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TY - JOUR

T1 - Interstitial OH radicals in F2-laser-irradiated bulk amorphous SiO2

AU - Kajihara, Koichi

AU - Hirano, Masahiro

AU - Skuja, Linards

AU - Hosono, Hideo

PY - 2006/6/1

Y1 - 2006/6/1

N2 - An interstitial hydroxyl radical (HȮ) has been generated in bulk amorphous SiO2 (a-SiO2) loaded with interstitial H2O molecules and exposed to F2 laser light (hv = 7.9 eV, λ = 157 nm) at 77 K. F2 laser light dissociates an O-H bond of interstitial H2O into a pair of hydrogen atom (Ḣ) and HO0. The resultant H0 disappears below 150 K, whereas HȮ is detectable after thermal annealing at 200 K. The electron paramagnetic resonance (EPR) signal of the interstitial HȮ recorded at 77 K is similar to that formed in amorphous ice, indicating that HȮ is confined in an orthorhombic field by hydrogen bonding, probably with adjacent H2O molecules, silanol (SiOH) groups, and bridging oxygen atoms in the a-SiO2 network.

AB - An interstitial hydroxyl radical (HȮ) has been generated in bulk amorphous SiO2 (a-SiO2) loaded with interstitial H2O molecules and exposed to F2 laser light (hv = 7.9 eV, λ = 157 nm) at 77 K. F2 laser light dissociates an O-H bond of interstitial H2O into a pair of hydrogen atom (Ḣ) and HO0. The resultant H0 disappears below 150 K, whereas HȮ is detectable after thermal annealing at 200 K. The electron paramagnetic resonance (EPR) signal of the interstitial HȮ recorded at 77 K is similar to that formed in amorphous ice, indicating that HȮ is confined in an orthorhombic field by hydrogen bonding, probably with adjacent H2O molecules, silanol (SiOH) groups, and bridging oxygen atoms in the a-SiO2 network.

UR - https://www.scopus.com/pages/publications/33745473772

U2 - 10.1021/jp061370y

DO - 10.1021/jp061370y

M3 - Article

AN - SCOPUS:33745473772

SN - 1520-6106

VL - 110

SP - 10224

EP - 10227

JO - Journal of Physical Chemistry B

JF - Journal of Physical Chemistry B

IS - 21

ER -

Interstitial OH radicals in F₂-laser-irradiated bulk amorphous SiO₂

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