Abstract
In this work, critical values of pore-formation in electrochemical machining of semiconductors of А3В5 group are studied. On the example of indium phosphide, the indicators of the series of dependence of current density on the voltage of anodization are studied. The rates of current density increase in the regime of gradual rise of anodization voltage are determined. According to these indicators, the intervals are established, within which the active pore-formation occurs on the surface of semiconductor.
| Original language | English |
|---|---|
| Title of host publication | 2021 IEEE 12th International Conference on Electronics and Information Technologies, ELIT 2021 - Proceedings |
| Pages | 190-193 |
| DOIs | |
| Publication status | Published - 2021 |
Keywords
- Current density
- Electrochemical etching
- Semiconductors
- Voltage of pore-formation
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