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Investigation of critical points of pore formation voltage on the surface of semiconductors of А3В5 group

  • Ihor Bohdanov
  • , Yana Suchikova
  • , Sergii Kovachov
  • , Valentina Peregudova
  • , Alma K. Dauletbekova
  • , Anatolijs Popovs

Research output: Chapter in Book/Report/Conference proceedingConference paperResearchpeer-review

1 Citation (Scopus)

Abstract

In this work, critical values of pore-formation in electrochemical machining of semiconductors of А3В5 group are studied. On the example of indium phosphide, the indicators of the series of dependence of current density on the voltage of anodization are studied. The rates of current density increase in the regime of gradual rise of anodization voltage are determined. According to these indicators, the intervals are established, within which the active pore-formation occurs on the surface of semiconductor.

Original languageEnglish
Title of host publication2021 IEEE 12th International Conference on Electronics and Information Technologies, ELIT 2021 - Proceedings
Pages190-193
DOIs
Publication statusPublished - 2021

Keywords

  • Current density
  • Electrochemical etching
  • Semiconductors
  • Voltage of pore-formation

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