Investigation of the Dynamics of Electrochemical Dissolution of n-InP(111) in Various Electrolyte Compositions and Determination of Optimal Etching Conditions

We present a study on the dynamics of the electrochemical dissolution of n-InP(111), explicitly analysing the behaviour of the ‘electrolyte– semiconductor’ system in different electrolyte compositions, based on the analysis of critical points of the electrochemical reaction. Critical points are defined as characteristics of the technological process, where active phase dissolution of the sample surface is observed. We determine the minimum and maximum current-density values required to initiate the pore formation process on the surface of n-InP(111) in different electrolyte compositions. Additionally, for all cases, the duration of the active phase of surface dissolution and the Flade’s potential values are determined. This allows us to establish optimal parameters for treatment time, current density, and anodizing voltage for etching n-InP(111) in aqueous and alcoholic solutions of hydrochloric, hydrofluoric, and nitric acids. This, in turn, enables understanding and investigation of the kinetics of electrochemical surface dissolution as an essential result for unifying the requirements of the technological process of nanostructuring the surface of indium phosphide. The tools presented for analysing the dynamics of the electrochemical dissolution of n-InP can be applied to assess the behaviour of various semiconductors during electrochemical etching.