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Local structure relaxation in nanocrystalline Ni1 - XO thin films

  • University of Latvia

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Non-stoichiometric nickel oxide (Ni1 - xO) thin films were prepared by DC magnetron sputtering technique in mixed Ar/O2 atmosphere and studied by synchrotron radiation Ni K-edge x-ray absorption spectroscopy, x-ray diffraction and scanning electron microscopy. The use of advanced modelling technique, combining classical molecular dynamics with ab initio multiple-scattering extended x-ray absorption fine structure calculations, allowed us to describe the structure relaxation and dynamics in nanocrystallites and to estimate their size and the concentration of nickel vacancies.

Original languageEnglish
Pages (from-to)58-62
Number of pages5
JournalThin Solid Films
Volume553
DOIs
Publication statusPublished - 28 Feb 2014

Keywords

  • EXAFS spectroscopy
  • Molecular dynamics
  • Nickel oxide
  • Thin films

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