Operation of spatial light modulators in DUV light

Ulrike Dauderstädt; Peter Dürr; Mathias Krellmann; Tord Karlin; Uldis Berzinsh; Lars Leonardsson; Horst Wendrock

Operation of spatial light modulators in DUV light

Ulrike Dauderstädt^*
, Peter Dürr
, Mathias Krellmann
, Tord Karlin
, Uldis Berzinsh
, Lars Leonardsson
, Horst Wendrock

^*Corresponding author for this work

Fraunhofer Institute for Microelectronic Circuits and Systems
Mycronic
Leibniz Institute for Solid State and Materials Research Dresden

Research output: Contribution to journal › Conference article › peer-review

1 Citation (Scopus)

Abstract

The Fraunhofer Institute for Microelectronic Circuits and Systems (FhG-IMS) has developed spatial light modulators (SLM), which are used in a pattern generator for DUV laser mask writing developed by Micronic Laser Systems. They consist of micromirror arrays and allow massive parallel writing in UV mask writers. The chip discussed here consists of 2048 × 512 individually addressable mirrors and can be run at a frame rate of 1 to 2 kHz. For this application it is necessary that the SLMs can be operated under DUV light without changing their performance. This paper discusses a failure mechanism of the SLMs when operated in DUV light and countermeasures to eliminate this effect.

Original language	English
Pages (from-to)	277-284
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4983
Publication status	Published - 2003
Externally published	Yes
Event	MOEMS and Miniaturized Systems III - San Jose, CA, United States Duration: 27 Jan 2003 → 29 Jan 2003

Keywords

DUV
Optical MEMS
Spatial Light Modulator

Cite this

@article{a0a529ed6feb4c51b2d03cc8de93430b,

title = "Operation of spatial light modulators in DUV light",

abstract = "The Fraunhofer Institute for Microelectronic Circuits and Systems (FhG-IMS) has developed spatial light modulators (SLM), which are used in a pattern generator for DUV laser mask writing developed by Micronic Laser Systems. They consist of micromirror arrays and allow massive parallel writing in UV mask writers. The chip discussed here consists of 2048 {\texttimes} 512 individually addressable mirrors and can be run at a frame rate of 1 to 2 kHz. For this application it is necessary that the SLMs can be operated under DUV light without changing their performance. This paper discusses a failure mechanism of the SLMs when operated in DUV light and countermeasures to eliminate this effect.",

keywords = "DUV, Optical MEMS, Spatial Light Modulator",

author = "Ulrike Dauderst{\"a}dt and Peter D{\"u}rr and Mathias Krellmann and Tord Karlin and Uldis Berzinsh and Lars Leonardsson and Horst Wendrock",

year = "2003",

language = "English",

volume = "4983",

pages = "277--284",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "MOEMS and Miniaturized Systems III ; Conference date: 27-01-2003 Through 29-01-2003",

}

TY - JOUR

T1 - Operation of spatial light modulators in DUV light

AU - Dauderstädt, Ulrike

AU - Dürr, Peter

AU - Krellmann, Mathias

AU - Karlin, Tord

AU - Berzinsh, Uldis

AU - Leonardsson, Lars

AU - Wendrock, Horst

PY - 2003

Y1 - 2003

N2 - The Fraunhofer Institute for Microelectronic Circuits and Systems (FhG-IMS) has developed spatial light modulators (SLM), which are used in a pattern generator for DUV laser mask writing developed by Micronic Laser Systems. They consist of micromirror arrays and allow massive parallel writing in UV mask writers. The chip discussed here consists of 2048 × 512 individually addressable mirrors and can be run at a frame rate of 1 to 2 kHz. For this application it is necessary that the SLMs can be operated under DUV light without changing their performance. This paper discusses a failure mechanism of the SLMs when operated in DUV light and countermeasures to eliminate this effect.

AB - The Fraunhofer Institute for Microelectronic Circuits and Systems (FhG-IMS) has developed spatial light modulators (SLM), which are used in a pattern generator for DUV laser mask writing developed by Micronic Laser Systems. They consist of micromirror arrays and allow massive parallel writing in UV mask writers. The chip discussed here consists of 2048 × 512 individually addressable mirrors and can be run at a frame rate of 1 to 2 kHz. For this application it is necessary that the SLMs can be operated under DUV light without changing their performance. This paper discusses a failure mechanism of the SLMs when operated in DUV light and countermeasures to eliminate this effect.

KW - DUV

KW - Optical MEMS

KW - Spatial Light Modulator

UR - https://www.scopus.com/pages/publications/17044442061

M3 - Conference article

AN - SCOPUS:17044442061

SN - 0277-786X

VL - 4983

SP - 277

EP - 284

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - MOEMS and Miniaturized Systems III

Y2 - 27 January 2003 through 29 January 2003

ER -

Operation of spatial light modulators in DUV light

Abstract

Keywords

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