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Passivating Oxide Layers on the Surface of InP

  • Yana Suchikova
  • , Sergii Kovachov
  • , Zhakyp Karipbaev
  • , Yaroslav Zhydachevskyy
  • , Ihor Bohdanov
  • , Anatolijs Popovs
  • Berdyansk State Pedagogical University
  • L.N. Gumilyov Eurasian National University

Research output: Chapter in Book/Report/Conference proceedingConference paperResearchpeer-review

1 Citation (Scopus)

Abstract

This study investigates the formation and characteristics of intrinsic oxide layers on the surface of n-type indium phosphide (InP), formed via electrochemical processing in a sulfuric acid environment. We have explored the oxide film's structure, chemical composition, and electronic properties using various analytical methods. The results indicate the formation of composite oxides with crackled morphologies and their impact on surface passivation. Our findings affirm the potential of InP native oxides for protective coatings yet highlight the need for further optimization to improve the uniformity and reduce the defectiveness of passivation layers.

Original languageEnglish
Title of host publication2024 IEEE 42nd International Conference on Electronics and Nanotechnology, ELNANO 2024 - Proceedings
Pages223-226
Number of pages4
ISBN (Electronic)9798350368178
DOIs
Publication statusPublished - 2024

Publication series

NameProceedings - IEEE International Conference on Electronics and Nanotechnology, ELNANO
ISSN (Print)2377-6935
ISSN (Electronic)2693-3535

Keywords

  • electrochemical etching
  • electroplating
  • indium phosphide
  • passivation
  • thin films

OECD Field of Science

  • 1.3 Physical Sciences

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