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Patterned laser crystallization of a-Si

  • B. Polyakov*
  • , G. Marcins
  • , M. Chubarov
  • , A. Kuzmin
  • , V. Klykov
  • , I. Tale
  • *Corresponding author for this work
  • University of Latvia
  • Sidrabe Inc.

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Thin films of amorphous Si on glass were crystallized by pulsed nano- and picosecond lasers. Two methods for creating the desired patterns of crystallized regions were used. In the former, the pattern is produced by a focused laser beam, and in the latter it is made using a prefabricated mask. The electric conductivity of crystallized films increases by more than 4 orders of magnitude in comparison with untreated amorphous films.

Original languageEnglish
Pages (from-to)50-54
Number of pages5
JournalLatvian Journal of Physics and Technical Sciences
Volume46
Issue number3
DOIs
Publication statusPublished - 1 Jan 2009

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