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Pb(Zr,Ti)O3 thin films on zirconium membranes for micromechanical applications

  • T. Maeder*
  • , P. Muralt
  • , L. Sagalowicz
  • , I. Reaney
  • , M. Kohli
  • , A. Kholkin
  • , N. Setter
  • *Corresponding author for this work
  • Swiss Federal Institute of Technology Lausanne

Research output: Contribution to journalArticlepeer-review

47 Citations (Scopus)

Abstract

An efficient, electrically conductive, chemical barrier for the integration of piezoelectric Pb(Zr,Ti)O3 (PZT) films on reactive metal substrates has been developed, opening new possibilities for PZT integration on micromechanical and semiconductor devices. Very reactive zirconium films have been taken in order to test the quality of the specially designed RuO2/Cr buffer under the condition of in situ sputter deposition of PZT at 600°C. The PZT/RuO2 interface was found to be free of intermediate phases. A PZT activated metallic micromechanical element was demonstrated with a thin film Zr membrane.

Original languageEnglish
Pages (from-to)776-778
Number of pages3
JournalApplied Physics Letters
Volume68
Issue number6
DOIs
Publication statusPublished - 1996
Externally publishedYes

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