Photochemical processes induced by 157-nm light in H2-impregnated glassy SiO2:OH

Masafumi Mizuguchi; Linards Skuja; Hideo Hosono; Tohru Ogawa

doi:10.1364/OL.24.000863

Photochemical processes induced by 157-nm light in H₂-impregnated glassy SiO₂:OH

Masafumi Mizuguchi^*
, Linards Skuja
, Hideo Hosono
, Tohru Ogawa

^*Corresponding author for this work

Laboratory of Optical Materials, Institute of Solid State Physics

Institute of Science Tokyo
Semiconduct. Leading Edge Technol.

Research output: Contribution to journal › Article › peer-review

24 Citations (Scopus)

Abstract

F₂ excimer-laser irradiation induces two major changes in SiO₂:OH glass impregnated with H₂ molecules. First, the vacuum-UV optical absorption edge is bleached, and the absorption at 157 nm decreases from 0.95 to 0.68 cm^-1. Second, preexisting free SiOH groups and interstitial H₂ are photochemically converted to hydrogen-bonded hydroxyl groups. It is suggested that the bleaching of the UV-absorption edge is caused by a change of OH groups from a free to a hydrogen-bonded state and by photolysis of distorted Si - O bonds that are absorbing in the edge region.

Original language	English
Pages (from-to)	863-865
Number of pages	3
Journal	Optics Letters
Volume	24
Issue number	13
DOIs	https://doi.org/10.1364/OL.24.000863
Publication status	Published - 1 Jul 1999

Access to Document

10.1364/OL.24.000863

Cite this

@article{e7d21332994748a4829e000dd92c4df7,

title = "Photochemical processes induced by 157-nm light in H2-impregnated glassy SiO2:OH",

abstract = "F2 excimer-laser irradiation induces two major changes in SiO2:OH glass impregnated with H2 molecules. First, the vacuum-UV optical absorption edge is bleached, and the absorption at 157 nm decreases from 0.95 to 0.68 cm-1. Second, preexisting free SiOH groups and interstitial H2 are photochemically converted to hydrogen-bonded hydroxyl groups. It is suggested that the bleaching of the UV-absorption edge is caused by a change of OH groups from a free to a hydrogen-bonded state and by photolysis of distorted Si - O bonds that are absorbing in the edge region.",

author = "Masafumi Mizuguchi and Linards Skuja and Hideo Hosono and Tohru Ogawa",

year = "1999",

month = jul,

day = "1",

doi = "10.1364/OL.24.000863",

language = "English",

volume = "24",

pages = "863--865",

journal = "Optics Letters",

issn = "0146-9592",

publisher = "Optica Publishing Group (formerly OSA)",

number = "13",

}

TY - JOUR

T1 - Photochemical processes induced by 157-nm light in H2-impregnated glassy SiO2:OH

AU - Mizuguchi, Masafumi

AU - Skuja, Linards

AU - Hosono, Hideo

AU - Ogawa, Tohru

PY - 1999/7/1

Y1 - 1999/7/1

N2 - F2 excimer-laser irradiation induces two major changes in SiO2:OH glass impregnated with H2 molecules. First, the vacuum-UV optical absorption edge is bleached, and the absorption at 157 nm decreases from 0.95 to 0.68 cm-1. Second, preexisting free SiOH groups and interstitial H2 are photochemically converted to hydrogen-bonded hydroxyl groups. It is suggested that the bleaching of the UV-absorption edge is caused by a change of OH groups from a free to a hydrogen-bonded state and by photolysis of distorted Si - O bonds that are absorbing in the edge region.

AB - F2 excimer-laser irradiation induces two major changes in SiO2:OH glass impregnated with H2 molecules. First, the vacuum-UV optical absorption edge is bleached, and the absorption at 157 nm decreases from 0.95 to 0.68 cm-1. Second, preexisting free SiOH groups and interstitial H2 are photochemically converted to hydrogen-bonded hydroxyl groups. It is suggested that the bleaching of the UV-absorption edge is caused by a change of OH groups from a free to a hydrogen-bonded state and by photolysis of distorted Si - O bonds that are absorbing in the edge region.

UR - https://www.scopus.com/pages/publications/0000485564

U2 - 10.1364/OL.24.000863

DO - 10.1364/OL.24.000863

M3 - Article

AN - SCOPUS:0000485564

SN - 0146-9592

VL - 24

SP - 863

EP - 865

JO - Optics Letters

JF - Optics Letters

IS - 13

ER -

Photochemical processes induced by 157-nm light in H₂-impregnated glassy SiO₂:OH

Abstract

Access to Document

Other files and links

Fingerprint

Cite this