Preparation and characterization of tin tungstate thin films

A. Kuzmin; M. Zubkins; R. Kalendarev

doi:10.1080/00150193.2015.1059682

Preparation and characterization of tin tungstate thin films

A. Kuzmin^*
, M. Zubkins
, R. Kalendarev

^*Corresponding author for this work

University of Latvia

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

Tin tungstate thin films were prepared by dc magnetron sputtering method and studied by x-ray diffraction, confocal microscopy and Raman spectroscopy. It is shown that the films are composed mainly of nanocrystalline α-SnWO₄ phase. The possibility to use these films as write-once optical recording media is demonstrated.

Original language	English
Pages (from-to)	49-54
Number of pages	6
Journal	Ferroelectrics
Volume	484
Issue number	1
DOIs	https://doi.org/10.1080/00150193.2015.1059682
Publication status	Published - 5 Aug 2015

Keywords

thin film
Tin tungstate

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10.1080/00150193.2015.1059682

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title = "Preparation and characterization of tin tungstate thin films",

abstract = "Tin tungstate thin films were prepared by dc magnetron sputtering method and studied by x-ray diffraction, confocal microscopy and Raman spectroscopy. It is shown that the films are composed mainly of nanocrystalline α-SnWO4 phase. The possibility to use these films as write-once optical recording media is demonstrated.",

keywords = "thin film, Tin tungstate",

author = "A. Kuzmin and M. Zubkins and R. Kalendarev",

note = "Publisher Copyright: {\textcopyright} 2015 Taylor \& Francis Group, LLC.",

year = "2015",

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doi = "10.1080/00150193.2015.1059682",

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T1 - Preparation and characterization of tin tungstate thin films

AU - Kuzmin, A.

AU - Zubkins, M.

AU - Kalendarev, R.

PY - 2015/8/5

Y1 - 2015/8/5

N2 - Tin tungstate thin films were prepared by dc magnetron sputtering method and studied by x-ray diffraction, confocal microscopy and Raman spectroscopy. It is shown that the films are composed mainly of nanocrystalline α-SnWO4 phase. The possibility to use these films as write-once optical recording media is demonstrated.

AB - Tin tungstate thin films were prepared by dc magnetron sputtering method and studied by x-ray diffraction, confocal microscopy and Raman spectroscopy. It is shown that the films are composed mainly of nanocrystalline α-SnWO4 phase. The possibility to use these films as write-once optical recording media is demonstrated.

KW - thin film

KW - Tin tungstate

UR - https://www.scopus.com/pages/publications/84947087251

U2 - 10.1080/00150193.2015.1059682

DO - 10.1080/00150193.2015.1059682

M3 - Article

AN - SCOPUS:84947087251

SN - 0015-0193

VL - 484

SP - 49

EP - 54

JO - Ferroelectrics

JF - Ferroelectrics

IS - 1

ER -

Preparation and characterization of tin tungstate thin films

Abstract

Keywords

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