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Pressure-dependent large area synthesis and electronic structure of MoS2

  • Dhananjay K. Sharma*
  • , E. Venkata Ramana
  • , Sara Fateixa
  • , María J. Hortigüela
  • , Gonzalo Otero-Irurueta
  • , Helena I.S. Nogueira
  • , Andrei Kholkin
  • *Corresponding author for this work
  • University of Aveiro
  • Ural Federal University

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

Molybdenum disulfide (MoS2) is a transition metal dichalcogenide, which along with graphene, has a great potential to become a material of choice for the next generation of nanoelectronics. We report the synthesis of a large-area MoS2 obtained by sulfurization of MoO3 using chemical vapor deposition (CVD) at different Ar base pressures. The optimal pressure for the growth was found to be ∼50 mbar (millibar). The evolution of MoS2 phase as a function of Ar gas pressure was monitored by confocal Raman spectroscopy. As synthesized MoS2 shows direct bandgap of 1.6 eV evaluated by UV–vis spectroscopy. We report for the first time the valence band spectra and the work function of MoS2 on SiO2/Si calculated by ultraviolet photoemission spectroscopy, which was found to be 4.67 eV. In-situ electrical measurements demonstrated expected semiconducting behavior of the grown triangular crystals. These studies show MoS2 crystallites growth by controlling the parameters in CVD process.

Original languageEnglish
Pages (from-to)265-271
Number of pages7
JournalMaterials Research Bulletin
Volume97
DOIs
Publication statusPublished - Jan 2018
Externally publishedYes

Keywords

  • Chemical vapor deposition (CVD)
  • HR-XPS
  • MoS
  • Transition metal dichalcogenides (TMDs)
  • UV–visible

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