Scanning probe microscopy of nanocrystalline iridium oxide thin films

D. Pailharey; D. Tonneau; A. Houel; A. Kuzmin; R. Kalendarev; J. Purans

doi:10.1117/12.517031

Scanning probe microscopy of nanocrystalline iridium oxide thin films

D. Pailharey^*
, D. Tonneau
, A. Houel
, A. Kuzmin
, R. Kalendarev
, J. Purans

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

Abstract

Structural investigations of nanocrystalline iridium oxide thin films, prepared by de magnetron sputtering technique, were performed by scanning probe microscopy (SPM). SPM studies, using both atomic force microscopy (AFM) and scanning tunnelling microscopy (STM), indicate that the thin films are composed of grains with a size of about 20-50 nm. Fine crystallinity and small RMS microroughness of the films, being well below 2 nm, make iridium oxide thin films promising candidates fox nanolithographic applications. The possibility to perform nanolithographic processes at a scale of less than 150 nm was successfully examined in AFM and STM modes.

Original language	English
Pages (from-to)	259-265
Number of pages	7
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5123
DOIs	https://doi.org/10.1117/12.517031
Publication status	Published - 2002
Event	PROCEEDINGS OF SPIE SPIE - The International Society for Optical Engineering: Advanced Optical Devices, Technologies, and Medical Applications - Riga, Latvia Duration: 19 Aug 2002 → 22 Aug 2002

Keywords

AFM
IrO thin films
Nanolithography
STM

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10.1117/12.517031

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title = "Scanning probe microscopy of nanocrystalline iridium oxide thin films",

abstract = "Structural investigations of nanocrystalline iridium oxide thin films, prepared by de magnetron sputtering technique, were performed by scanning probe microscopy (SPM). SPM studies, using both atomic force microscopy (AFM) and scanning tunnelling microscopy (STM), indicate that the thin films are composed of grains with a size of about 20-50 nm. Fine crystallinity and small RMS microroughness of the films, being well below 2 nm, make iridium oxide thin films promising candidates fox nanolithographic applications. The possibility to perform nanolithographic processes at a scale of less than 150 nm was successfully examined in AFM and STM modes.",

keywords = "AFM, IrO thin films, Nanolithography, STM",

author = "D. Pailharey and D. Tonneau and A. Houel and A. Kuzmin and R. Kalendarev and J. Purans",

year = "2002",

doi = "10.1117/12.517031",

language = "English",

volume = "5123",

pages = "259--265",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "PROCEEDINGS OF SPIE SPIE - The International Society for Optical Engineering: Advanced Optical Devices, Technologies, and Medical Applications ; Conference date: 19-08-2002 Through 22-08-2002",

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TY - JOUR

T1 - Scanning probe microscopy of nanocrystalline iridium oxide thin films

AU - Pailharey, D.

AU - Tonneau, D.

AU - Houel, A.

AU - Kuzmin, A.

AU - Kalendarev, R.

AU - Purans, J.

PY - 2002

Y1 - 2002

N2 - Structural investigations of nanocrystalline iridium oxide thin films, prepared by de magnetron sputtering technique, were performed by scanning probe microscopy (SPM). SPM studies, using both atomic force microscopy (AFM) and scanning tunnelling microscopy (STM), indicate that the thin films are composed of grains with a size of about 20-50 nm. Fine crystallinity and small RMS microroughness of the films, being well below 2 nm, make iridium oxide thin films promising candidates fox nanolithographic applications. The possibility to perform nanolithographic processes at a scale of less than 150 nm was successfully examined in AFM and STM modes.

AB - Structural investigations of nanocrystalline iridium oxide thin films, prepared by de magnetron sputtering technique, were performed by scanning probe microscopy (SPM). SPM studies, using both atomic force microscopy (AFM) and scanning tunnelling microscopy (STM), indicate that the thin films are composed of grains with a size of about 20-50 nm. Fine crystallinity and small RMS microroughness of the films, being well below 2 nm, make iridium oxide thin films promising candidates fox nanolithographic applications. The possibility to perform nanolithographic processes at a scale of less than 150 nm was successfully examined in AFM and STM modes.

KW - AFM

KW - IrO thin films

KW - Nanolithography

KW - STM

UR - https://www.scopus.com/pages/publications/0344513201

U2 - 10.1117/12.517031

DO - 10.1117/12.517031

M3 - Conference article

AN - SCOPUS:0344513201

SN - 0277-786X

VL - 5123

SP - 259

EP - 265

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - PROCEEDINGS OF SPIE SPIE - The International Society for Optical Engineering: Advanced Optical Devices, Technologies, and Medical Applications

Y2 - 19 August 2002 through 22 August 2002

ER -

Scanning probe microscopy of nanocrystalline iridium oxide thin films

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Keywords

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