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Simulation of oxidized silicon stripe formation on Pd(111)

  • Center for Physical Sciences and Technology

Research output: Contribution to journalConference articlepeer-review

Abstract

We propose the model with two interaction constants (nearest neighbour pair repulsion of SiO complexes and their trio attraction in a line) which demonstrates stripe formation during silane decomposition on oxidized Pd(111) surface. The simplest (2 × 1) stripe phase is obtained by kinetic Monte Carlo simulation in absence of longer-range attractive interactions which are usually necessary for stripe structure formation. Despite higher energy, this phase is shown to be very stable. Phase diagram for this model is obtained, and (2 × 1) phase stability is analyzed varying coverage and reaction rate parameters.

Original languageEnglish
Pages (from-to)2731-2733
Number of pages3
JournalPhysica Status Solidi (C) Current Topics in Solid State Physics
Volume6
Issue number12
DOIs
Publication statusPublished - 2009
Event15th International Semiconducting and Insulating Materials Conference, SIMC-XV - Vilnius, Lithuania
Duration: 15 Jun 200919 Jun 2009

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