Spontaneous oxygen loading into SiO2 glass by thermal anneal

Koichi Kajihara; Taisuke Miura; Hayato Kamioka; Masahiro Hirano; Linards Skuja; Hideo Hosono

doi:10.1016/j.jnoncrysol.2004.08.143

Spontaneous oxygen loading into SiO₂ glass by thermal anneal

Koichi Kajihara^*
, Taisuke Miura
, Hayato Kamioka
, Masahiro Hirano
, Linards Skuja
, Hideo Hosono

^*Corresponding author for this work

Laboratory of Optical Materials, Institute of Solid State Physics

Research output: Contribution to journal › Conference article › peer-review

20 Citations (Scopus)

Abstract

The interstitial oxygen molecules (O₂) in SiO₂ glass were detected down to ∼10¹⁵cm^-3 by photoluminescence of O₂ at 1272nm excited at 765 nm by a continuous-wave titanium sapphire laser. It was evidenced that SiO₂ glass thermally annealed in air between 800 and 1100°C spontaneously absorbs ∼10 ¹⁶cm^-3 of O₂ from the ambient atmosphere. The time-dependent concentration change of the interstitial O₂ allows the determination of both the diffusion coefficient and the solubility of the interstitial O₂.

Original language	English
Pages (from-to)	205-208
Number of pages	4
Journal	Journal of Non-Crystalline Solids
Volume	349
Issue number	1-3
DOIs	https://doi.org/10.1016/j.jnoncrysol.2004.08.143
Publication status	Published - 1 Dec 2004
Event	Glass Science for High Technology. 16th University Conference - Troy, NY, United States Duration: 13 Aug 2004 → 15 Aug 2004

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10.1016/j.jnoncrysol.2004.08.143

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title = "Spontaneous oxygen loading into SiO2 glass by thermal anneal",

abstract = "The interstitial oxygen molecules (O2) in SiO2 glass were detected down to ∼1015cm-3 by photoluminescence of O2 at 1272nm excited at 765 nm by a continuous-wave titanium sapphire laser. It was evidenced that SiO2 glass thermally annealed in air between 800 and 1100°C spontaneously absorbs ∼10 16cm-3 of O2 from the ambient atmosphere. The time-dependent concentration change of the interstitial O2 allows the determination of both the diffusion coefficient and the solubility of the interstitial O2.",

author = "Koichi Kajihara and Taisuke Miura and Hayato Kamioka and Masahiro Hirano and Linards Skuja and Hideo Hosono",

year = "2004",

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doi = "10.1016/j.jnoncrysol.2004.08.143",

language = "English",

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journal = "Journal of Non-Crystalline Solids",

issn = "0022-3093",

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note = "Glass Science for High Technology. 16th University Conference ; Conference date: 13-08-2004 Through 15-08-2004",

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TY - JOUR

T1 - Spontaneous oxygen loading into SiO2 glass by thermal anneal

AU - Kajihara, Koichi

AU - Miura, Taisuke

AU - Kamioka, Hayato

AU - Hirano, Masahiro

AU - Skuja, Linards

AU - Hosono, Hideo

PY - 2004/12/1

Y1 - 2004/12/1

N2 - The interstitial oxygen molecules (O2) in SiO2 glass were detected down to ∼1015cm-3 by photoluminescence of O2 at 1272nm excited at 765 nm by a continuous-wave titanium sapphire laser. It was evidenced that SiO2 glass thermally annealed in air between 800 and 1100°C spontaneously absorbs ∼10 16cm-3 of O2 from the ambient atmosphere. The time-dependent concentration change of the interstitial O2 allows the determination of both the diffusion coefficient and the solubility of the interstitial O2.

AB - The interstitial oxygen molecules (O2) in SiO2 glass were detected down to ∼1015cm-3 by photoluminescence of O2 at 1272nm excited at 765 nm by a continuous-wave titanium sapphire laser. It was evidenced that SiO2 glass thermally annealed in air between 800 and 1100°C spontaneously absorbs ∼10 16cm-3 of O2 from the ambient atmosphere. The time-dependent concentration change of the interstitial O2 allows the determination of both the diffusion coefficient and the solubility of the interstitial O2.

UR - https://www.scopus.com/pages/publications/9644268859

U2 - 10.1016/j.jnoncrysol.2004.08.143

DO - 10.1016/j.jnoncrysol.2004.08.143

M3 - Conference article

AN - SCOPUS:9644268859

SN - 0022-3093

VL - 349

SP - 205

EP - 208

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

IS - 1-3

T2 - Glass Science for High Technology. 16th University Conference

Y2 - 13 August 2004 through 15 August 2004

ER -

Spontaneous oxygen loading into SiO₂ glass by thermal anneal

Abstract

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