Study of transparent ferroelectric thin films by optical reflectometry and ellipsometry

I. Aulika; V. Zauls; K. Kundzins; M. Kundzins; S. Katholy

Study of transparent ferroelectric thin films by optical reflectometry and ellipsometry

I. Aulika^*
, V. Zauls
, K. Kundzins
, M. Kundzins
, S. Katholy

^*Corresponding author for this work

University of Latvia
University of Potsdam

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

A method of analyzing variable-angle null-ellipsometry and reflectometry measurement data is proposed for barium titanate BaTiO₃ (BT), lead zirconate titanate PbZr_0,47Ti_0,53O₃ (PZT) and lead magnesium niobate Pb(Mn_0,33Nb_0,67)O₃ (PMN) thin films grown on Si/SiO₂/Ti/Pt, Si/TiO₂/Pt, substrates by laser ablation, sol-gel and rf sputtering. The refractive and absorption coefficients of the samples are determined in the phonon energy range of 1.65 - 3.53 eV. The variation of the optical property in BT thin films of various thickness was observed and explained by the characteristic film structure.

Original language	English
Pages (from-to)	755-761
Number of pages	7
Journal	Journal of Optoelectronics and Advanced Materials
Volume	5
Issue number	3
Publication status	Published - Sept 2003

Keywords

Absorption coefficient
Ellipsometry
Reflectometry
Refractive index

Cite this

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title = "Study of transparent ferroelectric thin films by optical reflectometry and ellipsometry",

abstract = "A method of analyzing variable-angle null-ellipsometry and reflectometry measurement data is proposed for barium titanate BaTiO3 (BT), lead zirconate titanate PbZr0,47Ti0,53O3 (PZT) and lead magnesium niobate Pb(Mn0,33Nb0,67)O3 (PMN) thin films grown on Si/SiO2/Ti/Pt, Si/TiO2/Pt, substrates by laser ablation, sol-gel and rf sputtering. The refractive and absorption coefficients of the samples are determined in the phonon energy range of 1.65 - 3.53 eV. The variation of the optical property in BT thin films of various thickness was observed and explained by the characteristic film structure.",

keywords = "Absorption coefficient, Ellipsometry, Reflectometry, Refractive index",

author = "I. Aulika and V. Zauls and K. Kundzins and M. Kundzins and S. Katholy",

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language = "English",

volume = "5",

pages = "755--761",

journal = "Journal of Optoelectronics and Advanced Materials",

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publisher = "National Institute of Optoelectronics",

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TY - JOUR

T1 - Study of transparent ferroelectric thin films by optical reflectometry and ellipsometry

AU - Aulika, I.

AU - Zauls, V.

AU - Kundzins, K.

AU - Kundzins, M.

AU - Katholy, S.

PY - 2003/9

Y1 - 2003/9

N2 - A method of analyzing variable-angle null-ellipsometry and reflectometry measurement data is proposed for barium titanate BaTiO3 (BT), lead zirconate titanate PbZr0,47Ti0,53O3 (PZT) and lead magnesium niobate Pb(Mn0,33Nb0,67)O3 (PMN) thin films grown on Si/SiO2/Ti/Pt, Si/TiO2/Pt, substrates by laser ablation, sol-gel and rf sputtering. The refractive and absorption coefficients of the samples are determined in the phonon energy range of 1.65 - 3.53 eV. The variation of the optical property in BT thin films of various thickness was observed and explained by the characteristic film structure.

AB - A method of analyzing variable-angle null-ellipsometry and reflectometry measurement data is proposed for barium titanate BaTiO3 (BT), lead zirconate titanate PbZr0,47Ti0,53O3 (PZT) and lead magnesium niobate Pb(Mn0,33Nb0,67)O3 (PMN) thin films grown on Si/SiO2/Ti/Pt, Si/TiO2/Pt, substrates by laser ablation, sol-gel and rf sputtering. The refractive and absorption coefficients of the samples are determined in the phonon energy range of 1.65 - 3.53 eV. The variation of the optical property in BT thin films of various thickness was observed and explained by the characteristic film structure.

KW - Absorption coefficient

KW - Ellipsometry

KW - Reflectometry

KW - Refractive index

UR - https://www.scopus.com/pages/publications/0347595121

M3 - Article

AN - SCOPUS:0347595121

SN - 1454-4164

VL - 5

SP - 755

EP - 761

JO - Journal of Optoelectronics and Advanced Materials

JF - Journal of Optoelectronics and Advanced Materials

IS - 3

ER -

Study of transparent ferroelectric thin films by optical reflectometry and ellipsometry

Abstract

Keywords

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