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Surface dissolution and diffusion of oxygen molecules in SiO2 glass

  • Koichi Kajihara*
  • , Taisuke Miura
  • , Hayato Kamioka
  • , Masahiro Hirano
  • , Linards Skuja
  • , Hideo Hosono
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

53 Citations (Scopus)

Abstract

Surface dissolution and diffusion of oxygen molecules (O2) in SiO2 glass were studied by their photoluminescence at 1272 nm excited with a titanium sapphire laser oscillating at 765 nm. The dissolution of O 2 from ambient atmosphere at both surfaces was much faster than the following diffusion of O2 into SiO2 glass, indicating that the surface dissolution is not the rate-limiting step for the saturation of SiO2 glass with O2. The time- and temperature-dependent concentration changes of O2 allow to evaluate the diffusion coefficient and the saturation solubility of O2 in SiO2 glass.

Original languageEnglish
Pages (from-to)559-562
Number of pages4
JournalJournal of the Ceramic Society of Japan
Volume112
Issue number1310
DOIs
Publication statusPublished - Oct 2004

Keywords

  • Diffusion
  • Interstitial oxygen molecule
  • Photoluminescence
  • Surface dissolution

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