Abstract
Surface dissolution and diffusion of oxygen molecules (O2) in SiO2 glass were studied by their photoluminescence at 1272 nm excited with a titanium sapphire laser oscillating at 765 nm. The dissolution of O 2 from ambient atmosphere at both surfaces was much faster than the following diffusion of O2 into SiO2 glass, indicating that the surface dissolution is not the rate-limiting step for the saturation of SiO2 glass with O2. The time- and temperature-dependent concentration changes of O2 allow to evaluate the diffusion coefficient and the saturation solubility of O2 in SiO2 glass.
| Original language | English |
|---|---|
| Pages (from-to) | 559-562 |
| Number of pages | 4 |
| Journal | Journal of the Ceramic Society of Japan |
| Volume | 112 |
| Issue number | 1310 |
| DOIs | |
| Publication status | Published - Oct 2004 |
Keywords
- Diffusion
- Interstitial oxygen molecule
- Photoluminescence
- Surface dissolution
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