The adsorption of SiO molecules on MgO Surfaces as a model for the silicon lever atomic force microscope (AFM)

E. Kotomin; A. Shluger; M. Causá; R. Dovesi; F. Ricca

doi:10.1016/0039-6028(90)90133-S

The adsorption of SiO molecules on MgO Surfaces as a model for the silicon lever atomic force microscope (AFM)

E. Kotomin^*
, A. Shluger
, M. Causá
, R. Dovesi
, F. Ricca

^*Corresponding author for this work

University of Turin

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

Computer simulation of a 1 :4 SiO monolayer adsorbed on a MgO monatomic slab has been performed by using the CRYSTAL "ab initio" program. The Mg²⁺ ions have been identified as the preferred adsorption sites. Adsorption energies, geometries and electron densities have been evaluated. Their dependence on the interlayer distance has been considered for investigating the behaviour of the AFM with microfabricated silicon lever in the pressure region of 10^-8 N. The AFM topographical images are strongly dependent on the chemical nature of the tip.

Original language	English
Pages (from-to)	399-406
Number of pages	8
Journal	Surface Science
Volume	232
Issue number	3
DOIs	https://doi.org/10.1016/0039-6028(90)90133-S
Publication status	Published - 2 Jun 1990
Externally published	Yes

Access to Document

10.1016/0039-6028(90)90133-S

Cite this

@article{78563d69ddaf48e793104380b98dd1fe,

title = "The adsorption of SiO molecules on MgO Surfaces as a model for the silicon lever atomic force microscope (AFM)",

abstract = "Computer simulation of a 1 :4 SiO monolayer adsorbed on a MgO monatomic slab has been performed by using the CRYSTAL {"}ab initio{"} program. The Mg2+ ions have been identified as the preferred adsorption sites. Adsorption energies, geometries and electron densities have been evaluated. Their dependence on the interlayer distance has been considered for investigating the behaviour of the AFM with microfabricated silicon lever in the pressure region of 10-8 N. The AFM topographical images are strongly dependent on the chemical nature of the tip.",

author = "E. Kotomin and A. Shluger and M. Caus{\'a} and R. Dovesi and F. Ricca",

year = "1990",

month = jun,

day = "2",

doi = "10.1016/0039-6028(90)90133-S",

language = "English",

volume = "232",

pages = "399--406",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier B.V.",

number = "3",

}

TY - JOUR

T1 - The adsorption of SiO molecules on MgO Surfaces as a model for the silicon lever atomic force microscope (AFM)

AU - Kotomin, E.

AU - Shluger, A.

AU - Causá, M.

AU - Dovesi, R.

AU - Ricca, F.

PY - 1990/6/2

Y1 - 1990/6/2

N2 - Computer simulation of a 1 :4 SiO monolayer adsorbed on a MgO monatomic slab has been performed by using the CRYSTAL "ab initio" program. The Mg2+ ions have been identified as the preferred adsorption sites. Adsorption energies, geometries and electron densities have been evaluated. Their dependence on the interlayer distance has been considered for investigating the behaviour of the AFM with microfabricated silicon lever in the pressure region of 10-8 N. The AFM topographical images are strongly dependent on the chemical nature of the tip.

AB - Computer simulation of a 1 :4 SiO monolayer adsorbed on a MgO monatomic slab has been performed by using the CRYSTAL "ab initio" program. The Mg2+ ions have been identified as the preferred adsorption sites. Adsorption energies, geometries and electron densities have been evaluated. Their dependence on the interlayer distance has been considered for investigating the behaviour of the AFM with microfabricated silicon lever in the pressure region of 10-8 N. The AFM topographical images are strongly dependent on the chemical nature of the tip.

UR - https://www.scopus.com/pages/publications/0011519894

U2 - 10.1016/0039-6028(90)90133-S

DO - 10.1016/0039-6028(90)90133-S

M3 - Article

AN - SCOPUS:0011519894

SN - 0039-6028

VL - 232

SP - 399

EP - 406

JO - Surface Science

JF - Surface Science

IS - 3

ER -

The adsorption of SiO molecules on MgO Surfaces as a model for the silicon lever atomic force microscope (AFM)

Abstract

Access to Document

Other files and links

Fingerprint

Cite this