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Thermal behaviour of magnetron sputtered tungsten and tungsten-boride thin films

  • Līga Avotiņa
  • , Lada Bumbure
  • , Annija Elizabete Goldmane
  • , Edgars Vanags
  • , Marina Romanova
  • , Hermanis Sorokins
  • , Aleksandrs Zaslavskis
  • , Gunta Ķizāne
  • , Yuri Dekhtyar
  • Riga Technical University
  • University of Latvia
  • Joint Stock Company “ALFA RPAR”

Research output: Chapter in Book/Report/Conference proceedingConference paperResearchpeer-review

3 Citations (Scopus)

Abstract

Magnetron sputtered tungsten and tungsten diboride nanofilms are proposed to be used in microelectronic devices. Methods of deposition for nanofilms on oxidized silicon followed by etching is among the techniques to be applied for production. However, physical-chemical interactions between various films need to be taken into account. Therefore, a complete surface and in-depth characterization of synthesized films is necessary. Tungsten and tungsten diboride nanofilms are deposited by magnetron sputtering technique, followed by plasma chemical and chemical etching. Characterization of the structures is separated in several main steps including surface morphology, analysis of element composition as well as characterization of thermal properties, including estimation of presence of thermally active emission centers and thermally induced chemical conversions.

Original languageEnglish
Title of host publication2022 27th International Conference on Applied Electronics, AE 2022
EditorsJiri Parker
Place of Publication[Pilsen]
PublisherIEEE
Pages29-32
Volume2022-September
ISBN (Electronic)9781665494816
ISBN (Print)9781665494816
DOIs
Publication statusPublished - 2022

Publication series

NameInternational Conference on Applied Electronics
Volume2022-September
ISSN (Print)1803-7232

OECD Field of Science

  • 1.4 Chemical Sciences

Keywords

  • nanofilms
  • thermal treatment
  • thermally stimulated exoelectron emission
  • tungsten
  • tungsten diboride

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