X-ray absorption study of the electronic structure of tungsten and molybdenum oxides on the O K-edge

J. Purans; A. Kuzmin; Ph Parent; C. Laffon

doi:10.1016/S0013-4686(01)00370-X

X-ray absorption study of the electronic structure of tungsten and molybdenum oxides on the O K-edge

J. Purans^*
, A. Kuzmin
, Ph Parent
, C. Laffon

^*Corresponding author for this work

Université Paris-Saclay

Research output: Contribution to journal › Article › peer-review

64 Citations (Scopus)

Abstract

Magnetron sputtered amorphous thin films a-WO₃, a-MoO₃ and doped a-WO₃:Ir have been studied by X-ray absorption spectroscopy on the oxygen K-edge in comparison with crystalline oxides as monoclinic m-WO₃, orthorhombic α-MoO₃, cubic Na_0.6WO₃, layered-type hexagonal h-WO₃ and WO₃·H₂O, having variable electronic and atomic structure. The changes in the XANES ranging 10-15 eV above the absorption edge are interpreted based on the known band-structure calculations. The high-energy features are related to the multiple-scattering processes (EXAFS) at the nearest atoms.

Original language	English
Pages (from-to)	1973-1976
Number of pages	4
Journal	Electrochimica Acta
Volume	46
Issue number	13-14
DOIs	https://doi.org/10.1016/S0013-4686(01)00370-X
Publication status	Published - 2 Apr 2001

Keywords

Electrochromic thin films
MoO
O K-edge
WO
X-Ray absorption spectroscopy

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10.1016/S0013-4686(01)00370-X

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title = "X-ray absorption study of the electronic structure of tungsten and molybdenum oxides on the O K-edge",

abstract = "Magnetron sputtered amorphous thin films a-WO3, a-MoO3 and doped a-WO3:Ir have been studied by X-ray absorption spectroscopy on the oxygen K-edge in comparison with crystalline oxides as monoclinic m-WO3, orthorhombic α-MoO3, cubic Na0.6WO3, layered-type hexagonal h-WO3 and WO3·H2O, having variable electronic and atomic structure. The changes in the XANES ranging 10-15 eV above the absorption edge are interpreted based on the known band-structure calculations. The high-energy features are related to the multiple-scattering processes (EXAFS) at the nearest atoms.",

keywords = "Electrochromic thin films, MoO, O K-edge, WO, X-Ray absorption spectroscopy",

author = "J. Purans and A. Kuzmin and Ph Parent and C. Laffon",

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TY - JOUR

T1 - X-ray absorption study of the electronic structure of tungsten and molybdenum oxides on the O K-edge

AU - Purans, J.

AU - Kuzmin, A.

AU - Parent, Ph

AU - Laffon, C.

PY - 2001/4/2

Y1 - 2001/4/2

N2 - Magnetron sputtered amorphous thin films a-WO3, a-MoO3 and doped a-WO3:Ir have been studied by X-ray absorption spectroscopy on the oxygen K-edge in comparison with crystalline oxides as monoclinic m-WO3, orthorhombic α-MoO3, cubic Na0.6WO3, layered-type hexagonal h-WO3 and WO3·H2O, having variable electronic and atomic structure. The changes in the XANES ranging 10-15 eV above the absorption edge are interpreted based on the known band-structure calculations. The high-energy features are related to the multiple-scattering processes (EXAFS) at the nearest atoms.

AB - Magnetron sputtered amorphous thin films a-WO3, a-MoO3 and doped a-WO3:Ir have been studied by X-ray absorption spectroscopy on the oxygen K-edge in comparison with crystalline oxides as monoclinic m-WO3, orthorhombic α-MoO3, cubic Na0.6WO3, layered-type hexagonal h-WO3 and WO3·H2O, having variable electronic and atomic structure. The changes in the XANES ranging 10-15 eV above the absorption edge are interpreted based on the known band-structure calculations. The high-energy features are related to the multiple-scattering processes (EXAFS) at the nearest atoms.

KW - Electrochromic thin films

KW - MoO

KW - O K-edge

KW - WO

KW - X-Ray absorption spectroscopy

UR - https://www.scopus.com/pages/publications/0035794548

U2 - 10.1016/S0013-4686(01)00370-X

DO - 10.1016/S0013-4686(01)00370-X

M3 - Article

AN - SCOPUS:0035794548

SN - 0013-4686

VL - 46

SP - 1973

EP - 1976

JO - Electrochimica Acta

JF - Electrochimica Acta

IS - 13-14

ER -

X-ray absorption study of the electronic structure of tungsten and molybdenum oxides on the O K-edge

Abstract

Keywords

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