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XAS, XRD, AFM and Raman studies of nickel tungstate electrochromic thin films

  • A. Kuzmin
  • , J. Purans*
  • , R. Kalendarev
  • , D. Pailharey
  • , Y. Mathey
  • *Corresponding author for this work
  • University of Latvia
  • Faculté des Science de Lumini

Research output: Contribution to journalArticlepeer-review

62 Citations (Scopus)

Abstract

Systematic studies of nanocrystalline nickel tungstate, NiWO4, thin films were performed by several experimental techniques such as Ni K- and W L1,3-edges X-ray absorption spectroscopy, X-ray diffraction, Raman spectroscopy, atomic force microscopy and cyclic voltammetry measurements. We found that the NiWO4 thin films exhibit electrochromic properties similar to that of amorphous tungsten trioxide films, but show better structural stability upon multiple colouring/bleaching cycling. It was observed that a nanocrystallinity of the thin films results in strong modifications of the Ni-O and W-O interactions, which affect both local atomic and vibrational structures.

Original languageEnglish
Pages (from-to)2233-2236
Number of pages4
JournalElectrochimica Acta
Volume46
Issue number13-14
DOIs
Publication statusPublished - 2 Apr 2001

Keywords

  • Atomic force microscopy
  • Nickel tungstate thin films
  • Raman spectroscopy
  • X-ray absorption spectroscopy
  • X-ray diffraction

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