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Diffusion and reactions of interstitial oxygen species in amorphous SiO2: A review

  • Koichi Kajihara*
  • , Taisuke Miura
  • , Hayato Kamioka
  • , Akira Aiba
  • , Motoko Uramoto
  • , Yukihiro Morimoto
  • , Masahiro Hirano
  • , Linards Skuja
  • , Hideo Hosono
  • *Šī darba korespondējošais autors
  • Japan Science and Technology Agency
  • Tokyo Metropolitan University
  • OMRON Laserfront Inc.
  • University of Tsukuba
  • USHIO Inc
  • Institute of Science Tokyo

Zinātniskās darbības rezultāts: Devums žurnālamZinātniskais raksts (žurnālā)koleģiāli recenzēts

72 Atsauces (Scopus)

Kopsavilkums

This article briefly summarizes the diffusion and reactions of interstitial oxygen species in amorphous SiO2 (a-SiO2). The most common form of interstitial oxygen species is oxygen molecule (O2), which is sensitively detectable via its characteristic infrared photoluminescence (PL) at 1272 nm. The PL observation of interstitial O2 provides key data to verify various processes related to interstitial oxygen species: the dominant role of interstitial O2 in long-range oxygen transport in a-SiO2; formation of the Frenkel defect pair (Si-Si bond and interstitial oxygen atom, O0) by dense electronic excitation; efficient photolysis of interstitial O2 into O0 with F2 laser light (λ = 157 nm, hν = 7.9 eV); and creation of interstitial ozone molecule via reaction of interstitial O2 with photogenerated O0. The efficient formation of interstitial O0 by F2 laser photolysis makes it possible to investigate the mobility, optical absorption, and chemical reactions of interstitial O0. The observed properties of O0 are consistent with the model that O0 takes the configuration of Si-O-O-Si bond. Interstitial O2 and O0 react with dangling bonds, oxygen vacancies, and chloride groups in a-SiO2. Reactions of interstitial O2 and O0 with mobile interstitial hydrogen species produce interstitial water molecules and hydroperoxy radicals. Interstitial hydroxyl radicals are formed by F2 laser photolysis of interstitial water molecules.

OriģinālvalodaAngļu
Lapas (no-līdz)224-232
Lapu skaits9
ŽurnālsJournal of Non-Crystalline Solids
Sējums354
Izdevuma numurs2-9
DOIs
Publikācijas statussPublicēts - 15 janv. 2008

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