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Electron beam charge injection and modification of electronical and optical properties of SiO2

  • H. J. Fitting*
  • , M. Goldberg
  • , A. N. Trukhin
  • , T. Barfels
  • *Šī darba korespondējošais autors
  • University of Rostock

Zinātniskās darbības rezultāts: Devums konferencēKonferences rakstskoleģiāli recenzēts

1 Atsauce (Scopus)

Kopsavilkums

Ionizing radiation in the dielectric and optically transparent material SiO2 produces defect luminescence as well as exoelectron emission. Under cathodo-excitation, e.g. the main blue luminescence band at 460 nm (2.7 eV) is appearing and then strongly growing with an exponential saturation. The luminescence center is correlated with oxygen deficiency and twofold-coordinated silicon = Si:. A simple oxygen vacancy presents the precursor for this kind of defect transformation. A comparison of different excitation-relaxation processes like cathodoluminescence (CL), charge injection (IV) and trapping, secondary electron field emission (SEFE), and exoelectron emission (EEE) leads to a generally similar excitation-dose behaviour with an electron beam saturation dose of about 0.01-0.1 As/cm2. This suggests itself a correlation of these four excitation mechanisms likely related to the same kind of defect in glassy SiO2.

OriģinālvalodaAngļu
Lapas696-699
Lapu skaits4
Publikācijas statussPublicēts - 1998
Ārēji publicēts
PasākumsProceedings of the 1998 3rd International Conference on Electric Charge in Solid Insulators, CSC'3 - Paris, Fr
Ilgums: 29 jūn. 19983 jūl. 1998

Konference

KonferenceProceedings of the 1998 3rd International Conference on Electric Charge in Solid Insulators, CSC'3
PilsētaParis, Fr
Periods29/06/983/07/98

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