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EXAFS study of mixed nickel molybdenum oxide thin films at the Ni and Mo K-edges

  • University of Latvia

Zinātniskās darbības rezultāts: Devums žurnālamKonferences zinātniskais rakstskoleģiāli recenzēts

7 Atsauces (Scopus)

Kopsavilkums

Mixed nickel molybdenum oxide thin films were produced by DC magnetron co-sputtering technique with the nickel content about 8, 16 and 25at%. X-ray absorption spectroscopy at the Ni and Mo K-edges was used to study the local atomic structure in the films. The best-fit analysis of the EXAFS signals suggests that (i) the films are amorphous, except for the highest nickel content (25at%), at which a segregation of NiO phase was observed; (ii) nickel and molybdenum atoms are octahedrally coordinated by oxygen atoms. Opposite to the NiO6 octahedra, the MoO6 octahedra are strongly distorted, that results in an existence of two groups of oxygen atoms - four nearest at ∼1.76Å and two distant at ∼2.2Å. It was also found that the MoO6 octahedra are joined by edges, with the Mo-Mo distance about 3.26-3.31Å.

OriģinālvalodaAngļu
Lapas (no-līdz)321-326
Lapu skaits6
ŽurnālsNuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Sējums531
Izdevuma numurs1-2
DOIs
Publikācijas statussPublicēts - 21 sept. 2004
PasākumsProceedings of the 5th International Worshop on Radiation - Riga, Latvija
Ilgums: 7 sept. 200311 sept. 2003

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