Interstitial OH radicals in F2-laser-irradiated bulk amorphous SiO2

Koichi Kajihara; Masahiro Hirano; Linards Skuja; Hideo Hosono

doi:10.1021/jp061370y

Interstitial OH radicals in F₂-laser-irradiated bulk amorphous SiO₂

Koichi Kajihara^*
, Masahiro Hirano
, Linards Skuja
, Hideo Hosono

^*Šī darba korespondējošais autors

Optisko materiālu laboratorija, Cietvielu fizikas institūts

Japan Science and Technology Agency
Institute of Science Tokyo

Zinātniskās darbības rezultāts: Devums žurnālam › Zinātniskais raksts (žurnālā) › koleģiāli recenzēts

6 Atsauces (Scopus)

Kopsavilkums

An interstitial hydroxyl radical (HO^̇) has been generated in bulk amorphous SiO₂ (a-SiO₂) loaded with interstitial H₂O molecules and exposed to F₂ laser light (hv = 7.9 eV, λ = 157 nm) at 77 K. F₂ laser light dissociates an O-H bond of interstitial H₂O into a pair of hydrogen atom (H^̇) and HO⁰. The resultant H⁰ disappears below 150 K, whereas HO^̇ is detectable after thermal annealing at 200 K. The electron paramagnetic resonance (EPR) signal of the interstitial HO^̇ recorded at 77 K is similar to that formed in amorphous ice, indicating that HO^̇ is confined in an orthorhombic field by hydrogen bonding, probably with adjacent H₂O molecules, silanol (SiOH) groups, and bridging oxygen atoms in the a-SiO₂ network.

Oriģinālvaloda	Angļu
Lapas (no-līdz)	10224-10227
Lapu skaits	4
Žurnāls	Journal of Physical Chemistry B
Sējums	110
Izdevuma numurs	21
DOIs	https://doi.org/10.1021/jp061370y
Publikācijas statuss	Publicēts - 1 jūn. 2006

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title = "Interstitial OH radicals in F2-laser-irradiated bulk amorphous SiO2",

abstract = "An interstitial hydroxyl radical (H{\.O}) has been generated in bulk amorphous SiO2 (a-SiO2) loaded with interstitial H2O molecules and exposed to F2 laser light (hv = 7.9 eV, λ = 157 nm) at 77 K. F2 laser light dissociates an O-H bond of interstitial H2O into a pair of hydrogen atom ({\.H}) and HO0. The resultant H0 disappears below 150 K, whereas H{\.O} is detectable after thermal annealing at 200 K. The electron paramagnetic resonance (EPR) signal of the interstitial H{\.O} recorded at 77 K is similar to that formed in amorphous ice, indicating that H{\.O} is confined in an orthorhombic field by hydrogen bonding, probably with adjacent H2O molecules, silanol (SiOH) groups, and bridging oxygen atoms in the a-SiO2 network.",

author = "Koichi Kajihara and Masahiro Hirano and Linards Skuja and Hideo Hosono",

year = "2006",

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doi = "10.1021/jp061370y",

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AU - Kajihara, Koichi

AU - Hirano, Masahiro

AU - Skuja, Linards

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Y1 - 2006/6/1

N2 - An interstitial hydroxyl radical (HȮ) has been generated in bulk amorphous SiO2 (a-SiO2) loaded with interstitial H2O molecules and exposed to F2 laser light (hv = 7.9 eV, λ = 157 nm) at 77 K. F2 laser light dissociates an O-H bond of interstitial H2O into a pair of hydrogen atom (Ḣ) and HO0. The resultant H0 disappears below 150 K, whereas HȮ is detectable after thermal annealing at 200 K. The electron paramagnetic resonance (EPR) signal of the interstitial HȮ recorded at 77 K is similar to that formed in amorphous ice, indicating that HȮ is confined in an orthorhombic field by hydrogen bonding, probably with adjacent H2O molecules, silanol (SiOH) groups, and bridging oxygen atoms in the a-SiO2 network.

AB - An interstitial hydroxyl radical (HȮ) has been generated in bulk amorphous SiO2 (a-SiO2) loaded with interstitial H2O molecules and exposed to F2 laser light (hv = 7.9 eV, λ = 157 nm) at 77 K. F2 laser light dissociates an O-H bond of interstitial H2O into a pair of hydrogen atom (Ḣ) and HO0. The resultant H0 disappears below 150 K, whereas HȮ is detectable after thermal annealing at 200 K. The electron paramagnetic resonance (EPR) signal of the interstitial HȮ recorded at 77 K is similar to that formed in amorphous ice, indicating that HȮ is confined in an orthorhombic field by hydrogen bonding, probably with adjacent H2O molecules, silanol (SiOH) groups, and bridging oxygen atoms in the a-SiO2 network.

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