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Modification of vacuum-ultraviolet absorption of SiOH groups in SiO2 glass with temperature, F2 laser irradiation, and H-D isotope exchange

  • Koichi Kajihara*
  • , Masahiro Hirano
  • , Linards Skuja
  • , Hideo Hosono
  • *Šī darba korespondējošais autors
  • Japan Science and Technology Agency
  • Institute of Science Tokyo

Zinātniskās darbības rezultāts: Devums žurnālamZinātniskais raksts (žurnālā)koleģiāli recenzēts

16 Atsauces (Scopus)

Kopsavilkums

Variations of vacuum-ultraviolet (VUV) absorption of silanol (SiOH) groups in synthetic wet SiO2 glass with temperature, exposure to F2 laser light, and with H-D isotope exchange were examined at photon energies below 8 eV. The intensity of the VUV absorption band decreases with cooling or with exposure to F2 laser light. The spectral changes in both cases are qualitatively similar and are attributed to an alternation of the bonding configuration of SiOH groups from isolated into hydrogen-bonded states. However, the resultant states are distinctly different: the hydrogen-bonded state formed on cooling is restored reversibly to the isolated state on heating, while that induced by F2 laser light is metastable and does not decay below 300 °C. The VUV absorption is also reduced by replacing SiOH groups with SiOD groups due to the decrease of the zero-point energy of the ground state associated with OH groups.

OriģinālvalodaAngļu
Lapas (no-līdz)2307-2310
Lapu skaits4
ŽurnālsJournal of Non-Crystalline Solids
Sējums352
Izdevuma numurs23-25
DOIs
Publikācijas statussPublicēts - 15 jūl. 2006

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