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Radiation-induced defects in antiferroelectric thin films

  • Roland Bittner*
  • , K. Humer
  • , H. W. Weber
  • , K. Kundzins
  • , A. Sternberg
  • *Šī darba korespondējošais autors
  • TU Wien
  • University of Latvia

Zinātniskās darbības rezultāts: Devums žurnālamZinātniskais raksts (žurnālā)koleģiāli recenzēts

4 Atsauces (Scopus)

Kopsavilkums

Radiation effects on highly oriented antiferroelectric (AFE) PbZrO 3 (PZ) films with a thickness of approximately 400 nm are investigated in view of their possible application as a temperature sensitive element in a new bolometer system for fusion devices like ITER. The films were prepared by pulsed laser deposition (PLD). The dielectric constant was measured in the frequency range from 1 to 250 kHz in a stepwise cooling mode (∼2 °C min-1) from 400 °C to room temperature before and after irradiation to a fast neutron fluence of 2 × 1022 m -2 (E > 0.1 MeV). After irradiation, the films were annealed in several steps up to ∼400 °C to remove the radiation-induced defects. The results are discussed in terms of two kinds of radiation effects, i.e. structural defects (oxygen vacancies) and radiation-induced charges, trapped at defect structures. The measurements show significant differences to sol-gel PZ thin films, which is mainly explained by the high quality of the PLD films.

OriģinālvalodaAngļu
Lapas (no-līdz)833-836
Lapu skaits4
ŽurnālsFusion Engineering and Design
Sējums66-68
DOIs
Publikācijas statussPublicēts - sept. 2003

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