Structure and composition of sputter-deposited nickel-tungsten oxide films

S. V. Green; A. Kuzmin; J. Purans; C. G. Granqvist; G. A. Niklasson

doi:10.1016/j.tsf.2010.10.033

Structure and composition of sputter-deposited nickel-tungsten oxide films

S. V. Green
, A. Kuzmin
, J. Purans
, C. G. Granqvist
, G. A. Niklasson

Uppsala University

Pētījuma izpildes rezultāts: Devums žurnālam › Zinātniskais raksts (žurnālā) › koleģiāli recenzēts

72 Atsauces (Scopus)

Kopsavilkums

Films of mixed nickel-tungsten oxide, denoted Ni_xW_1-x oxide, were prepared by reactive DC magnetron co-sputtering from metallic targets and were characterized by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, X-ray diffractometry and Raman spectroscopy. A consistent picture of the structure and composition emerged, and at x < 0.50 the films comprised a mixture of amorphous WO₃ and nanosized NiWO₄, at x = 0.50 the nanosized NiWO₄ phase was dominating, and at x > 0.50 the films contained nanosized NiO and NiWO ₄.

Oriģinālvaloda	Angļu
Lapas (no-līdz)	2062-2066
Lapu skaits	5
Žurnāls	Thin Solid Films
Sējums	519
Izdevuma numurs	7
DOIs	https://doi.org/10.1016/j.tsf.2010.10.033
Publikācijas statuss	Publicēts - 31 janv. 2011

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@article{e1cb4b2853b04ef2a0e4d55497f5f810,

title = "Structure and composition of sputter-deposited nickel-tungsten oxide films",

abstract = "Films of mixed nickel-tungsten oxide, denoted NixW1-x oxide, were prepared by reactive DC magnetron co-sputtering from metallic targets and were characterized by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, X-ray diffractometry and Raman spectroscopy. A consistent picture of the structure and composition emerged, and at x < 0.50 the films comprised a mixture of amorphous WO3 and nanosized NiWO4, at x = 0.50 the nanosized NiWO4 phase was dominating, and at x > 0.50 the films contained nanosized NiO and NiWO 4.",

keywords = "Nickel oxide, Raman spectroscopy, Rutherford backscattering, Tungsten oxide, X-ray diffraction, X-ray photoelectron spectroscopy",

author = "Green, \{S. V.\} and A. Kuzmin and J. Purans and Granqvist, \{C. G.\} and Niklasson, \{G. A.\}",

year = "2011",

month = jan,

day = "31",

doi = "10.1016/j.tsf.2010.10.033",

language = "English",

volume = "519",

pages = "2062--2066",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

number = "7",

}

TY - JOUR

T1 - Structure and composition of sputter-deposited nickel-tungsten oxide films

AU - Green, S. V.

AU - Kuzmin, A.

AU - Purans, J.

AU - Granqvist, C. G.

AU - Niklasson, G. A.

PY - 2011/1/31

Y1 - 2011/1/31

N2 - Films of mixed nickel-tungsten oxide, denoted NixW1-x oxide, were prepared by reactive DC magnetron co-sputtering from metallic targets and were characterized by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, X-ray diffractometry and Raman spectroscopy. A consistent picture of the structure and composition emerged, and at x < 0.50 the films comprised a mixture of amorphous WO3 and nanosized NiWO4, at x = 0.50 the nanosized NiWO4 phase was dominating, and at x > 0.50 the films contained nanosized NiO and NiWO 4.

AB - Films of mixed nickel-tungsten oxide, denoted NixW1-x oxide, were prepared by reactive DC magnetron co-sputtering from metallic targets and were characterized by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, X-ray diffractometry and Raman spectroscopy. A consistent picture of the structure and composition emerged, and at x < 0.50 the films comprised a mixture of amorphous WO3 and nanosized NiWO4, at x = 0.50 the nanosized NiWO4 phase was dominating, and at x > 0.50 the films contained nanosized NiO and NiWO 4.

KW - Nickel oxide

KW - Raman spectroscopy

KW - Rutherford backscattering

KW - Tungsten oxide

KW - X-ray diffraction

KW - X-ray photoelectron spectroscopy

UR - https://www.scopus.com/pages/publications/78751642394

UR - http://www.sciencedirect.com/science/article/pii/S0040609010014483

U2 - 10.1016/j.tsf.2010.10.033

DO - 10.1016/j.tsf.2010.10.033

M3 - Article

AN - SCOPUS:78751642394

SN - 0040-6090

VL - 519

SP - 2062

EP - 2066

JO - Thin Solid Films

JF - Thin Solid Films

IS - 7

ER -

Structure and composition of sputter-deposited nickel-tungsten oxide films

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