Study of copper nitride thin film structure

A. Kuzmin; A. Kalinko; A. Anspoks; J. Timoshenko; R. Kalendarev

doi:10.1515/lpts-2016-0011

Study of copper nitride thin film structure

A. Kuzmin
, A. Kalinko
, A. Anspoks
, J. Timoshenko
, R. Kalendarev

EXAFS spektroskopijas laboratorija, Cietvielu fizikas institūts

University of Latvia

Zinātniskās darbības rezultāts: Devums žurnālam › Zinātniskais raksts (žurnālā) › koleģiāli recenzēts

6 Atsauces (Scopus)

Kopsavilkums

X-ray diffraction and x-ray absorption spectroscopy at the Cu K-edge were used to study the atomic structure in copper nitride (Cu₃N) thin films. Textured nanocrystalline films are obtained upon dc magnetron sputtering on substrates heated at about 190 °C, whereas amorphous films having strongly disordered structure already in the second coordination shell of copper are deposited in the absence of heating.

Oriģinālvaloda	Angļu
Lapas (no-līdz)	31-37
Lapu skaits	7
Žurnāls	Latvian Journal of Physics and Technical Sciences
Sējums	53
Izdevuma numurs	2
DOIs	https://doi.org/10.1515/lpts-2016-0011
Publikācijas statuss	Publicēts - 2016

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title = "Study of copper nitride thin film structure",

abstract = "X-ray diffraction and x-ray absorption spectroscopy at the Cu K-edge were used to study the atomic structure in copper nitride (Cu3N) thin films. Textured nanocrystalline films are obtained upon dc magnetron sputtering on substrates heated at about 190 °C, whereas amorphous films having strongly disordered structure already in the second coordination shell of copper are deposited in the absence of heating.",

keywords = "Copper nitride, Thin film, X-ray absorption spectroscopy, X-ray diffraction",

author = "A. Kuzmin and A. Kalinko and A. Anspoks and J. Timoshenko and R. Kalendarev",

year = "2016",

doi = "10.1515/lpts-2016-0011",

language = "English",

volume = "53",

pages = "31--37",

journal = "Latvian Journal of Physics and Technical Sciences",

issn = "0868-8257",

publisher = "Institute of Physical Energetics (Latvia)",

number = "2",

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TY - JOUR

T1 - Study of copper nitride thin film structure

AU - Kuzmin, A.

AU - Kalinko, A.

AU - Anspoks, A.

AU - Timoshenko, J.

AU - Kalendarev, R.

PY - 2016

Y1 - 2016

N2 - X-ray diffraction and x-ray absorption spectroscopy at the Cu K-edge were used to study the atomic structure in copper nitride (Cu3N) thin films. Textured nanocrystalline films are obtained upon dc magnetron sputtering on substrates heated at about 190 °C, whereas amorphous films having strongly disordered structure already in the second coordination shell of copper are deposited in the absence of heating.

AB - X-ray diffraction and x-ray absorption spectroscopy at the Cu K-edge were used to study the atomic structure in copper nitride (Cu3N) thin films. Textured nanocrystalline films are obtained upon dc magnetron sputtering on substrates heated at about 190 °C, whereas amorphous films having strongly disordered structure already in the second coordination shell of copper are deposited in the absence of heating.

KW - Copper nitride

KW - Thin film

KW - X-ray absorption spectroscopy

KW - X-ray diffraction

UR - https://www.scopus.com/pages/publications/84996566966

U2 - 10.1515/lpts-2016-0011

DO - 10.1515/lpts-2016-0011

M3 - Article

AN - SCOPUS:84996566966

SN - 0868-8257

VL - 53

SP - 31

EP - 37

JO - Latvian Journal of Physics and Technical Sciences

JF - Latvian Journal of Physics and Technical Sciences

IS - 2

ER -

Study of copper nitride thin film structure

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