Study of transparent ferroelectric thin films by optical reflectometry and ellipsometry

I. Aulika; V. Zauls; K. Kundzins; M. Kundzins; S. Katholy

Study of transparent ferroelectric thin films by optical reflectometry and ellipsometry

I. Aulika^*
, V. Zauls
, K. Kundzins
, M. Kundzins
, S. Katholy

^*Šī darba korespondējošais autors

University of Latvia
University of Potsdam

Zinātniskās darbības rezultāts: Devums žurnālam › Zinātniskais raksts (žurnālā) › koleģiāli recenzēts

15 Atsauces (Scopus)

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A method of analyzing variable-angle null-ellipsometry and reflectometry measurement data is proposed for barium titanate BaTiO₃ (BT), lead zirconate titanate PbZr_0,47Ti_0,53O₃ (PZT) and lead magnesium niobate Pb(Mn_0,33Nb_0,67)O₃ (PMN) thin films grown on Si/SiO₂/Ti/Pt, Si/TiO₂/Pt, substrates by laser ablation, sol-gel and rf sputtering. The refractive and absorption coefficients of the samples are determined in the phonon energy range of 1.65 - 3.53 eV. The variation of the optical property in BT thin films of various thickness was observed and explained by the characteristic film structure.

Oriģinālvaloda	Angļu
Lapas (no-līdz)	755-761
Lapu skaits	7
Žurnāls	Journal of Optoelectronics and Advanced Materials
Sējums	5
Izdevuma numurs	3
Publikācijas statuss	Publicēts - sept. 2003

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title = "Study of transparent ferroelectric thin films by optical reflectometry and ellipsometry",

abstract = "A method of analyzing variable-angle null-ellipsometry and reflectometry measurement data is proposed for barium titanate BaTiO3 (BT), lead zirconate titanate PbZr0,47Ti0,53O3 (PZT) and lead magnesium niobate Pb(Mn0,33Nb0,67)O3 (PMN) thin films grown on Si/SiO2/Ti/Pt, Si/TiO2/Pt, substrates by laser ablation, sol-gel and rf sputtering. The refractive and absorption coefficients of the samples are determined in the phonon energy range of 1.65 - 3.53 eV. The variation of the optical property in BT thin films of various thickness was observed and explained by the characteristic film structure.",

keywords = "Absorption coefficient, Ellipsometry, Reflectometry, Refractive index",

author = "I. Aulika and V. Zauls and K. Kundzins and M. Kundzins and S. Katholy",

year = "2003",

month = sep,

language = "English",

volume = "5",

pages = "755--761",

journal = "Journal of Optoelectronics and Advanced Materials",

issn = "1454-4164",

publisher = "National Institute of Optoelectronics",

number = "3",

}

TY - JOUR

T1 - Study of transparent ferroelectric thin films by optical reflectometry and ellipsometry

AU - Aulika, I.

AU - Zauls, V.

AU - Kundzins, K.

AU - Kundzins, M.

AU - Katholy, S.

PY - 2003/9

Y1 - 2003/9

N2 - A method of analyzing variable-angle null-ellipsometry and reflectometry measurement data is proposed for barium titanate BaTiO3 (BT), lead zirconate titanate PbZr0,47Ti0,53O3 (PZT) and lead magnesium niobate Pb(Mn0,33Nb0,67)O3 (PMN) thin films grown on Si/SiO2/Ti/Pt, Si/TiO2/Pt, substrates by laser ablation, sol-gel and rf sputtering. The refractive and absorption coefficients of the samples are determined in the phonon energy range of 1.65 - 3.53 eV. The variation of the optical property in BT thin films of various thickness was observed and explained by the characteristic film structure.

AB - A method of analyzing variable-angle null-ellipsometry and reflectometry measurement data is proposed for barium titanate BaTiO3 (BT), lead zirconate titanate PbZr0,47Ti0,53O3 (PZT) and lead magnesium niobate Pb(Mn0,33Nb0,67)O3 (PMN) thin films grown on Si/SiO2/Ti/Pt, Si/TiO2/Pt, substrates by laser ablation, sol-gel and rf sputtering. The refractive and absorption coefficients of the samples are determined in the phonon energy range of 1.65 - 3.53 eV. The variation of the optical property in BT thin films of various thickness was observed and explained by the characteristic film structure.

KW - Absorption coefficient

KW - Ellipsometry

KW - Reflectometry

KW - Refractive index

UR - https://www.scopus.com/pages/publications/0347595121

M3 - Article

AN - SCOPUS:0347595121

SN - 1454-4164

VL - 5

SP - 755

EP - 761

JO - Journal of Optoelectronics and Advanced Materials

JF - Journal of Optoelectronics and Advanced Materials

IS - 3

ER -

Study of transparent ferroelectric thin films by optical reflectometry and ellipsometry

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