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Thermal Stability of Color Centers in Lithium Fluoride Crystals Irradiated with Electrons and N, O, Kr, U Ions

  • Zhadra Malikova
  • , Zhakyp T. Karipbayev*
  • , Abdirash Akilbekov
  • , Alma Dauletbekova
  • , Anatoli I. Popov*
  • , Vladimir N. Kuzovkov
  • , Ainash Abdrakhmetova
  • , Alyona Russakova
  • , Muratbek Baizhumanov
  • *Šī darba korespondējošais autors
  • L.N. Gumilyov Eurasian National University
  • Sarsen Amanzholov East Kazakhstan State University

Zinātniskās darbības rezultāts: Devums žurnālamZinātniskais raksts (žurnālā)koleģiāli recenzēts

1 Atsauce (Scopus)

Kopsavilkums

Lithium fluoride (LiF) crystals are widely employed both as optical windows transparent in the ultraviolet spectral region and as efficient personal dosimeters, with their application scope recently expanding into lithium-ion technologies. Moreover, as an alkali halide crystal (AHC), LiF serves as a model system for studying and simulating radiation effects in solids. This work identifies radiation-induced defects formed in lithium fluoride upon irradiation with swift heavy ion beams (N, O, Kr, U) and intense pulsed electron beams, investigates their thermal stability, and performs computer modeling of annealing processes. The theoretical analysis of existing experimental kinetics for (Formula presented.) -centers induced by electron and heavy ion irradiation reveals considerable differences in the activation energies for interstitial migration. A strong correlation between the activation energy (Formula presented.) and the pre-exponential factor (Formula presented.) ((Formula presented.)) is observed; notably, (Formula presented.) ((Formula presented.)) is no longer constant but closely matches the potential function Ea. Indeed, with increasing irradiation dose, both the migration energy (Formula presented.) and pre-exponential factor (Formula presented.) decrease simultaneously, leading to an effective increase in the defect diffusion rate.

OriģinālvalodaAngļu
Raksta numurs4441
ŽurnālsMaterials
Sējums18
Izdevuma numurs19
DOIs
Publikācijas statussPublicēts - okt. 2025

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