UV-VUV laser induced phenomena in SiO2 glass

Koichi Kajihara; Yoshiaki Ikuta; Masanori Oto; Masahiro Hirano; Linards Skuja; Hideo Hosono

doi:10.1016/j.nimb.2003.12.032

UV-VUV laser induced phenomena in SiO₂ glass

Koichi Kajihara^*
, Yoshiaki Ikuta
, Masanori Oto
, Masahiro Hirano
, Linards Skuja
, Hideo Hosono

^*Šī darba korespondējošais autors

Optisko materiālu laboratorija, Cietvielu fizikas institūts

Japan Science and Technology Agency
Syowa Elec. Wire and Cable Co. Ltd.
Institute of Science Tokyo

Zinātniskās darbības rezultāts: Devums žurnālam › Konferences zinātniskais raksts › koleģiāli recenzēts

49 Atsauces (Scopus)

Kopsavilkums

Creation and annihilation of point defects were studied for SiO₂ glass exposed to ultraviolet (UV) and vacuum UV (VUV) lights to improve transparency and radiation toughness of SiO₂ glass to UV-VUV laser light. Topologically disordered structure of SiO₂ glass featured by the distribution of Si-O-Si angle is a critical factor degrading transmittance near the fundamental absorption edge. Doping with terminal functional groups enhances the structural relaxation and reduces the number of strained Si-O-Si bonds by breaking up the glass network without creating the color centers. Transmittance and laser toughness of SiO₂ glass for F₂ laser is greatly improved in fluorine-doped SiO₂ glass, often referred as "modified silica glass". Interstitial hydrogenous species are mobile and reactive at ambient temperature, and play an important role in photochemical reactions induced by exposure to UV-VUV laser light. They terminate the dangling-bond type color centers, while enhancing the formation of the oxygen vacancies. These findings are utilized to develop a deep-UV optical fiber transmitting ArF laser photons with low radiation damage.

Oriģinālvaloda	Angļu
Lapas (no-līdz)	323-331
Lapu skaits	9
Žurnāls	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Sējums	218
Izdevuma numurs	1-4
DOIs	https://doi.org/10.1016/j.nimb.2003.12.032
Publikācijas statuss	Publicēts - jūn. 2004
Pasākums	Proceedings of the Twelfth International Conference on Radiation - Gramado, Brazīlija Ilgums: 31 aug. 2003 → 5 sept. 2003

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10.1016/j.nimb.2003.12.032

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title = "UV-VUV laser induced phenomena in SiO2 glass",

abstract = "Creation and annihilation of point defects were studied for SiO2 glass exposed to ultraviolet (UV) and vacuum UV (VUV) lights to improve transparency and radiation toughness of SiO2 glass to UV-VUV laser light. Topologically disordered structure of SiO2 glass featured by the distribution of Si-O-Si angle is a critical factor degrading transmittance near the fundamental absorption edge. Doping with terminal functional groups enhances the structural relaxation and reduces the number of strained Si-O-Si bonds by breaking up the glass network without creating the color centers. Transmittance and laser toughness of SiO2 glass for F2 laser is greatly improved in fluorine-doped SiO2 glass, often referred as {"}modified silica glass{"}. Interstitial hydrogenous species are mobile and reactive at ambient temperature, and play an important role in photochemical reactions induced by exposure to UV-VUV laser light. They terminate the dangling-bond type color centers, while enhancing the formation of the oxygen vacancies. These findings are utilized to develop a deep-UV optical fiber transmitting ArF laser photons with low radiation damage.",

author = "Koichi Kajihara and Yoshiaki Ikuta and Masanori Oto and Masahiro Hirano and Linards Skuja and Hideo Hosono",

year = "2004",

month = jun,

doi = "10.1016/j.nimb.2003.12.032",

language = "English",

volume = "218",

pages = "323--331",

journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",

issn = "0168-583X",

publisher = "Elsevier B.V.",

number = "1-4",

note = "Proceedings of the Twelfth International Conference on Radiation ; Conference date: 31-08-2003 Through 05-09-2003",

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UV-VUV laser induced phenomena in SiO₂ glass. / Kajihara, Koichi; Ikuta, Yoshiaki; Oto, Masanori u.c.
(gadā): Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Sēj. 218, Nr. 1-4, 06.2004, lpp. 323-331.

Zinātniskās darbības rezultāts: Devums žurnālam › Konferences zinātniskais raksts › koleģiāli recenzēts

TY - JOUR

T1 - UV-VUV laser induced phenomena in SiO2 glass

AU - Kajihara, Koichi

AU - Ikuta, Yoshiaki

AU - Oto, Masanori

AU - Hirano, Masahiro

AU - Skuja, Linards

AU - Hosono, Hideo

PY - 2004/6

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N2 - Creation and annihilation of point defects were studied for SiO2 glass exposed to ultraviolet (UV) and vacuum UV (VUV) lights to improve transparency and radiation toughness of SiO2 glass to UV-VUV laser light. Topologically disordered structure of SiO2 glass featured by the distribution of Si-O-Si angle is a critical factor degrading transmittance near the fundamental absorption edge. Doping with terminal functional groups enhances the structural relaxation and reduces the number of strained Si-O-Si bonds by breaking up the glass network without creating the color centers. Transmittance and laser toughness of SiO2 glass for F2 laser is greatly improved in fluorine-doped SiO2 glass, often referred as "modified silica glass". Interstitial hydrogenous species are mobile and reactive at ambient temperature, and play an important role in photochemical reactions induced by exposure to UV-VUV laser light. They terminate the dangling-bond type color centers, while enhancing the formation of the oxygen vacancies. These findings are utilized to develop a deep-UV optical fiber transmitting ArF laser photons with low radiation damage.

AB - Creation and annihilation of point defects were studied for SiO2 glass exposed to ultraviolet (UV) and vacuum UV (VUV) lights to improve transparency and radiation toughness of SiO2 glass to UV-VUV laser light. Topologically disordered structure of SiO2 glass featured by the distribution of Si-O-Si angle is a critical factor degrading transmittance near the fundamental absorption edge. Doping with terminal functional groups enhances the structural relaxation and reduces the number of strained Si-O-Si bonds by breaking up the glass network without creating the color centers. Transmittance and laser toughness of SiO2 glass for F2 laser is greatly improved in fluorine-doped SiO2 glass, often referred as "modified silica glass". Interstitial hydrogenous species are mobile and reactive at ambient temperature, and play an important role in photochemical reactions induced by exposure to UV-VUV laser light. They terminate the dangling-bond type color centers, while enhancing the formation of the oxygen vacancies. These findings are utilized to develop a deep-UV optical fiber transmitting ArF laser photons with low radiation damage.

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